Very low threshold current density 1.3 μm GaInNAs single-quantum well lasers grown by molecular beam epitaxy

被引:35
作者
Wang, SM [1 ]
Wei, YQ [1 ]
Wang, XD [1 ]
Zhao, Q [1 ]
Sadeghi, M [1 ]
Larsson, A [1 ]
机构
[1] Chalmers Univ Technol, Dept Microelect & Nanosci, Photon Lab, SE-41296 Gothenburg, Sweden
关键词
low-dimensional structures; molecular beam epitaxy; semiconductor III-V materials; laser diodes;
D O I
10.1016/j.jcrysgro.2004.12.150
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We report molecular beam epitaxy (MBE) growth and device performance of 1.3μ m GaInNAs/GaNAs singlequantum well lasers on GaAs substrates. Record low threshold current densities of 300, 320 and 360A/cm(2) for cavity lengths of 1200, 1000 and 800 μ m, respectively, and a transparency current density of only 84 A/cm(2) are achieved for the 100 put wide broad area lasers. A characteristic temperature of 108 K is measured in the temperature range of 8-70 ° C for a laser with a cavity length of 1000 μ m. We find that optimization of the RF nitrogen source during the MBE growth plays a crucial role in reducing the threshold current density. © 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:734 / 738
页数:5
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