Electrical characterization of ZnO-based homojunctions

被引:58
作者
Lu, J. G. [1 ]
Ye, Z. Z.
Yuan, G. D.
Zeng, Y. J.
Zhuge, F.
Zhu, L. P.
Zhao, B. H.
Zhang, S. B.
机构
[1] Zhejiang Univ, State Key Lab Silicon Mat, Hangzhou 310027, Peoples R China
[2] Natl Renewable Energy Lab, Golden, CO 80401 USA
基金
中国国家自然科学基金;
关键词
D O I
10.1063/1.2245221
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electrical characteristics have been studied for ZnO p-n and p-i-n homojunctions, with optimization of device structures for improved performance. Capacitance-voltage measurements confirm the formation of abrupt junctions. The current-voltage characteristics exhibit their inherent electrical rectification behavior. The p-ZnO:(N,Al)/n-ZnO:Al homojunctions fabricated on sapphire substrates combining with the intrinsic ZnO buffer layer have acceptable p-n diode characteristics, with the forward turn-on voltage of 1.4 V and the reverse breakdown voltage of 5.3 V. By introduction of an intrinsic (Zn,Cd)O layer, the resultant p-ZnO:(N,Al)/i-(Zn,Cd)O/n-ZnO:Al homojunction exhibits a high reverse breakdown voltage of similar to 18 V.
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页数:3
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