Doping and hydrogen passivation of boron in silicon nanowires synthesized by laser ablation

被引:57
作者
Fukata, N.
Chen, J.
Sekiguchi, T.
Okada, N.
Murakami, K.
Tsurui, T.
Ito, S.
机构
[1] Natl Inst Mat Sci, Adv Elect Mat Ctr, Tsukuba, Ibaraki 3050044, Japan
[2] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[3] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[4] Univ Tsukuba, Special Res Project Nanosci, Tsukuba, Ibaraki 3058573, Japan
关键词
D O I
10.1063/1.2372698
中图分类号
O59 [应用物理学];
学科分类号
摘要
Local vibrational modes of boron (B) in silicon nanowires (SiNWs) synthesized by laser ablation were observed at about 618 and 640 cm(-1) by Raman scattering measurements. Boron doping was performed during the growth of SiNWs. Fano [Phys. Rev. 124, 1866 (1961)] broadening was also observed in the Si optical phonon peak. These results prove that B atoms were doped in the SiNWs. Hydrogen (H) passivation of B acceptors in the SiNWs was also investigated. A broad peak was observed at around 650-680 cm(-1) after hydrogenation, demonstrating that B dopants were passivated by the formation of the well-known H-B passivation centers. (c) 2006 American Institute of Physics.
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页数:3
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