NATURE OF THE DOMINANT DEEP TRAP IN AMORPHOUS-SILICON NITRIDE

被引:91
作者
KRICK, DT [1 ]
LENAHAN, PM [1 ]
KANICKI, J [1 ]
机构
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源
PHYSICAL REVIEW B | 1988年 / 38卷 / 12期
关键词
D O I
10.1103/PhysRevB.38.8226
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:8226 / 8229
页数:4
相关论文
共 27 条
[1]   SILICON-NITRIDE TRAP PROPERTIES AS REVEALED BY CHARGE-CENTROID MEASUREMENTS ON MNOS DEVICES [J].
ARNETT, PC ;
YUN, BH .
APPLIED PHYSICS LETTERS, 1975, 26 (03) :94-96
[2]   PREPARATION AND C-V CHARACTERISTICS OF SI-SI3N4 AND SI-SIO2-SI3N4 STRUCTURES [J].
CHU, TL ;
SZEDON, JR ;
LEE, CH .
SOLID-STATE ELECTRONICS, 1967, 10 (09) :897-&
[3]   METAL-NITRIDE-OXIDE-SILICON(MNOS) TRANSISTOR - CHARACTERISTICS AND APPLICATIONS [J].
FROHMANB.D .
PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1970, 58 (08) :1207-+
[4]   DANGLING BONDS IN MEMORY-QUALITY SILICON-NITRIDE FILMS [J].
FUJITA, S ;
SASAKI, A .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (02) :398-402
[5]   E' CENTER IN GLASSY SIO2 - O-17, H-1, AND VERY WEAK SI-29 SUPERHYPERFINE STRUCTURE [J].
GRISCOM, DL .
PHYSICAL REVIEW B, 1980, 22 (09) :4192-4202
[6]   METASTABLE DEFECTS IN AMORPHOUS-SILICON THIN-FILM TRANSISTORS [J].
HEPBURN, AR ;
MARSHALL, JM ;
MAIN, C ;
POWELL, MJ ;
VANBERKEL, C .
PHYSICAL REVIEW LETTERS, 1986, 56 (20) :2215-2218
[7]   ELECTRON-SPIN-RESONANCE STUDY OF DEFECTS IN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITED SILICON-NITRIDE [J].
JOUSSE, D ;
KANICKI, J ;
KRICK, DT ;
LENAHAN, PM .
APPLIED PHYSICS LETTERS, 1988, 52 (06) :445-447
[8]   HYDROGEN-RELATED MEMORY TRAPS IN THIN SILICON-NITRIDE FILMS [J].
KAPOOR, VJ ;
BAILEY, RS ;
STEIN, HJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :600-607
[9]   CHARGE STORAGE AND DISTRIBUTION IN THE NITRIDE LAYER OF THE METAL-NITRIDE-OXIDE SEMICONDUCTOR STRUCTURES [J].
KAPOOR, VJ ;
TURI, RA .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) :311-319
[10]   VALENCE ALTERNATION PAIR MODEL OF CHARGE STORAGE IN MNOS MEMORY DEVICES [J].
KIRK, CT .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) :4190-4195