THE TRANSITION FROM ALPHA-ZR TO ALPHA-ZRO2 GROWTH IN SPUTTER-DEPOSITED FILMS AS A FUNCTION OF GAS O2 CONTENT, RARE-GAS TYPE, AND CATHODE VOLTAGE

被引：33

作者：

KWOK, CK ^{[1
]}

AITA, CR ^{[1
]}

机构：

[1] UNIV WISCONSIN, SURFACE STUDIES LAB, MILWAUKEE, WI 53201 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.576261

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1235 / 1239

页数：5

共 39 条

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