GLOW-DISCHARGE MASS-SPECTROMETRY FOR SPUTTERING DISCHARGE DIAGNOSTICS

被引：34

作者：

AITA, CR ^{[1
]}

机构：

[1] UNIV WISCONSIN, SURFACE STUDIES LAB, MILWAUKEE, WI 53201 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572965

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：625 / 630

页数：6

共 58 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS
ABE, T
YAMASHINA, T
[J]. THIN SOLID FILMS, 1975, 30 (01) : 19 - 27
[2] RARE GAS-OXYGEN EFFECTS ON THE RF SPUTTER DEPOSITION OF PLATINUM
AITA, CR
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[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (10) : 6051 - 6052
[3] BASAL ORIENTATION ALUMINUM NITRIDE GROWN AT LOW-TEMPERATURE BY RF DIODE SPUTTERING
AITA, CR
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (03) : 1807 - 1808
[4] SPUTTER DEPOSITION OF PLATINUM FILMS IN ARGON OXYGEN AND NEON OXYGEN DISCHARGES
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TRAN, NC
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (04) : 958 - 963
[5] THE EFFECT OF O-2 ON REACTIVELY SPUTTERED ZINC-OXIDE
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[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5533 - 5536
[6] GLOW-DISCHARGE MASS-SPECTROMETRY OF SPUTTERED TANTALUM NITRIDE
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 324 - 327
[7] ENHANCEMENT OF TA+ FLUX BY SUBSTRATE BIASING DURING SPUTTER DEPOSITION OF TANTALUM NITROGEN FILMS
AITA, CR
MYERS, TA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 348 - 351
[8] ARGON-OXYGEN INTERACTION IN RF-SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) : 6584 - 6587
[9] THE EFFECT OF RF POWER ON REACTIVELY SPUTTERED ZINC-OXIDE
AITA, CR
LAD, RJ
TISONE, TC
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (12) : 6405 - 6410
[10] OPTICAL-EMISSION FROM NEON OXYGEN RF SPUTTERING GLOW-DISCHARGES
AITA, CR
MARHIC, ME
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (01): : 69 - 73

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