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INFLUENCE OF SILICON SURFACE DEFECTS ON MOS RADIATION-SENSITIVITY
被引:9
作者
:
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
HUGHES, HL
[
1
]
KING, EE
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
KING, EE
[
1
]
机构
:
[1]
USN,RES LAB,WASHINGTON,DC 20375
来源
:
IEEE TRANSACTIONS ON NUCLEAR SCIENCE
|
1976年
/ 23卷
/ 06期
关键词
:
D O I
:
10.1109/TNS.1976.4328542
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1573 / 1579
页数:7
相关论文
共 25 条
[1]
RADIATION HARDENING OF P-MOS DEVICES BY OPTIMIZATION OF THERMAL S102 GATE INSULATOR
AUBUCHON, KG
论文数:
0
引用数:
0
h-index:
0
AUBUCHON, KG
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1971,
NS18
(06)
: 117
-
+
[2]
TEST FOR LATERAL NONUNIFORMITIES IN MOS DEVICES USING ONLY CAPACITANCE CURVES
BREWS, JR
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TELE LABS,MURRAY HILL,NJ 07974
BELL TELE LABS,MURRAY HILL,NJ 07974
BREWS, JR
LOPEZ, AD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TELE LABS,MURRAY HILL,NJ 07974
BELL TELE LABS,MURRAY HILL,NJ 07974
LOPEZ, AD
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(11)
: 1267
-
1277
[3]
DESCRIPTION OF SIO2-SI INTERFACE PROPERTIES BY MEANS OF VERY LOW FREQUENCY MOS CAPACITANCE MEASUREMENTS
CASTAGNE, R
论文数:
0
引用数:
0
h-index:
0
CASTAGNE, R
VAPAILLE, A
论文数:
0
引用数:
0
h-index:
0
VAPAILLE, A
[J].
SURFACE SCIENCE,
1971,
28
(01)
: 157
-
+
[4]
CHANG CC, 1976, THESIS PRINCETON U
[5]
DEFECT GENERATION IN SILICON
DUMIN, DJ
论文数:
0
引用数:
0
h-index:
0
DUMIN, DJ
HENRY, WN
论文数:
0
引用数:
0
h-index:
0
HENRY, WN
[J].
METALLURGICAL TRANSACTIONS,
1971,
2
(03):
: 677
-
&
[6]
FABULA J, 1976, N0001475C1101 CONTR
[7]
NEW FAST TECHNIQUE FOR LARGE-SCALE MEASUREMENTS OF GENERATION LIFETIME IN SEMICONDUCTORS
FAHRNER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
FAHRNER, WR
SCHNEIDER, CP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
SCHNEIDER, CP
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(01)
: 100
-
105
[8]
FISHER AW, 1966, J ELECTROCHEM SOC, V113, P1054
[9]
PROCESS-CONTROLS FOR RADIATION-HARDENED ALUMINUM GATE BULK SILICON CMOS
GREGORY, BL
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
GREGORY, BL
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
: 2295
-
2302
[10]
PRE-IRRADIATION INDICATOR FOR TOTAL-DOSE IONIZING RADIATION-SENSITIVITY
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
HUGHES, HL
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(05)
: 2118
-
2119
←
1
2
3
→
共 25 条
[1]
RADIATION HARDENING OF P-MOS DEVICES BY OPTIMIZATION OF THERMAL S102 GATE INSULATOR
AUBUCHON, KG
论文数:
0
引用数:
0
h-index:
0
AUBUCHON, KG
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1971,
NS18
(06)
: 117
-
+
[2]
TEST FOR LATERAL NONUNIFORMITIES IN MOS DEVICES USING ONLY CAPACITANCE CURVES
BREWS, JR
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TELE LABS,MURRAY HILL,NJ 07974
BELL TELE LABS,MURRAY HILL,NJ 07974
BREWS, JR
LOPEZ, AD
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TELE LABS,MURRAY HILL,NJ 07974
BELL TELE LABS,MURRAY HILL,NJ 07974
LOPEZ, AD
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(11)
: 1267
-
1277
[3]
DESCRIPTION OF SIO2-SI INTERFACE PROPERTIES BY MEANS OF VERY LOW FREQUENCY MOS CAPACITANCE MEASUREMENTS
CASTAGNE, R
论文数:
0
引用数:
0
h-index:
0
CASTAGNE, R
VAPAILLE, A
论文数:
0
引用数:
0
h-index:
0
VAPAILLE, A
[J].
SURFACE SCIENCE,
1971,
28
(01)
: 157
-
+
[4]
CHANG CC, 1976, THESIS PRINCETON U
[5]
DEFECT GENERATION IN SILICON
DUMIN, DJ
论文数:
0
引用数:
0
h-index:
0
DUMIN, DJ
HENRY, WN
论文数:
0
引用数:
0
h-index:
0
HENRY, WN
[J].
METALLURGICAL TRANSACTIONS,
1971,
2
(03):
: 677
-
&
[6]
FABULA J, 1976, N0001475C1101 CONTR
[7]
NEW FAST TECHNIQUE FOR LARGE-SCALE MEASUREMENTS OF GENERATION LIFETIME IN SEMICONDUCTORS
FAHRNER, WR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
FAHRNER, WR
SCHNEIDER, CP
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
IBM CORP, SYST PROD DIV, E FISHKILL FACIL, Hopewell Jct, NY 12533 USA
SCHNEIDER, CP
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(01)
: 100
-
105
[8]
FISHER AW, 1966, J ELECTROCHEM SOC, V113, P1054
[9]
PROCESS-CONTROLS FOR RADIATION-HARDENED ALUMINUM GATE BULK SILICON CMOS
GREGORY, BL
论文数:
0
引用数:
0
h-index:
0
机构:
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
SANDIA LABS, ALBUQUERQUE, NM 87115 USA
GREGORY, BL
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(06)
: 2295
-
2302
[10]
PRE-IRRADIATION INDICATOR FOR TOTAL-DOSE IONIZING RADIATION-SENSITIVITY
HUGHES, HL
论文数:
0
引用数:
0
h-index:
0
机构:
USN,RES LAB,WASHINGTON,DC 20375
USN,RES LAB,WASHINGTON,DC 20375
HUGHES, HL
[J].
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1975,
22
(05)
: 2118
-
2119
←
1
2
3
→