共 15 条
ONE-STEP GROWTH OF BURIED HETEROSTRUCTURES BY CHEMICAL BEAM EPITAXY OVER PATTERNED INP SUBSTRATES
被引:2
作者:

RUDRA, A
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

SUGIURA, H
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h-index: 0
机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

LING, J
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

BONARD, JM
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

GANIERE, JD
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

DEFAYS, M
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

ARAUJO, D
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne

ILEGEMS, M
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机构: Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne
机构:
[1] Institute for Micro- and Optoelectronics, Ecole Polytechnique Fédérale de Lausanne
关键词:
D O I:
10.1016/0022-0248(94)90404-9
中图分类号:
O7 [晶体学];
学科分类号:
0702 ;
070205 ;
0703 ;
080501 ;
摘要:
We studied the formation of buried heterostructures obtained in a single growth step over nonplanar substrates patterned with ridges. When the ridge dimensions are large enough, the growth on the mesa top is similar to that on a planar substrate. In contrast, ridge spacings below almost-equal-to 10 mum influence the composition of the alloys grown on the ridge as well as those grown in the valley centre. The possible surface mechanisms which may explain this behaviour are discussed.
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页码:173 / 178
页数:6
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[1]
INDIUM ADATOM MIGRATION DURING MOLECULAR-BEAM EPITAXIAL-GROWTH OF STRAINED INGAAS/GAAS SINGLE QUANTUM WELLS
[J].
ARENT, DJ
;
NILSSON, S
;
GALEUCHET, YD
;
MEIER, HP
;
WALTER, W
.
APPLIED PHYSICS LETTERS,
1989, 55 (25)
:2611-2613

ARENT, DJ
论文数: 0 引用数: 0
h-index: 0

NILSSON, S
论文数: 0 引用数: 0
h-index: 0

GALEUCHET, YD
论文数: 0 引用数: 0
h-index: 0

MEIER, HP
论文数: 0 引用数: 0
h-index: 0

WALTER, W
论文数: 0 引用数: 0
h-index: 0
[2]
NONPLANAR AND MASKED-AREA EPITAXY BY ORGANOMETALLIC CHEMICAL-VAPOR-DEPOSITION
[J].
BHAT, R
.
SEMICONDUCTOR SCIENCE AND TECHNOLOGY,
1993, 8 (06)
:984-993

BHAT, R
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank, NJ
[3]
QUANTUM WIRE LASERS BY OMCVD GROWTH ON NONPLANAR SUBSTRATES
[J].
BHAT, R
;
KAPON, E
;
SIMHONY, S
;
COLAS, E
;
HWANG, DM
;
STOFFEL, NG
;
KOZA, MA
.
JOURNAL OF CRYSTAL GROWTH,
1991, 107 (1-4)
:716-723

BHAT, R
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank

KAPON, E
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank

SIMHONY, S
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank

COLAS, E
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank

HWANG, DM
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank

STOFFEL, NG
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank

KOZA, MA
论文数: 0 引用数: 0
h-index: 0
机构: Bellcore, Red Bank
[4]
INDIUM MIGRATION AND CONTROLLED LATERAL BANDGAP VARIATIONS IN HIGH-POWER STRAINED LAYER INGAAS-ALGAAS LASERS GROWN ON NONPLANAR SUBSTRATES
[J].
BROVELLI, LR
;
ARENT, DJ
;
JAECKEL, H
;
MEIER, HP
.
IEEE JOURNAL OF QUANTUM ELECTRONICS,
1991, 27 (06)
:1470-1475

BROVELLI, LR
论文数: 0 引用数: 0
h-index: 0
机构: IBM Research Division, Zurich Research Laboratory, Riischlikon

ARENT, DJ
论文数: 0 引用数: 0
h-index: 0
机构: IBM Research Division, Zurich Research Laboratory, Riischlikon

JAECKEL, H
论文数: 0 引用数: 0
h-index: 0
机构: IBM Research Division, Zurich Research Laboratory, Riischlikon

MEIER, HP
论文数: 0 引用数: 0
h-index: 0
机构: IBM Research Division, Zurich Research Laboratory, Riischlikon
[5]
HIGH-SPEED WAVE-GUIDE-INTEGRATED PHOTODIODES GROWN BY METAL ORGANIC MOLECULAR-BEAM EPITAXY
[J].
EMEIS, N
;
SCHIER, M
;
HOFFMANN, L
;
HEINECKE, H
;
BAUR, B
.
ELECTRONICS LETTERS,
1992, 28 (04)
:344-345

EMEIS, N
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Research Laboratories, 8000 München 83

SCHIER, M
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Research Laboratories, 8000 München 83

HOFFMANN, L
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Research Laboratories, 8000 München 83

HEINECKE, H
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Research Laboratories, 8000 München 83

BAUR, B
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Research Laboratories, 8000 München 83
[6]
EFFECT OF SURFACE ORIENTATION ON GAINASP MATERIAL COMPOSITION IN MOMBE (CBE)
[J].
HEINECKE, H
;
BAUR, B
;
HOGER, R
;
JOBST, B
;
MIKLIS, A
.
JOURNAL OF CRYSTAL GROWTH,
1992, 124 (1-4)
:170-175

HEINECKE, H
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Corporate Research and Development, D- W-8000 München 83

BAUR, B
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Corporate Research and Development, D- W-8000 München 83

HOGER, R
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Corporate Research and Development, D- W-8000 München 83

JOBST, B
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Corporate Research and Development, D- W-8000 München 83

MIKLIS, A
论文数: 0 引用数: 0
h-index: 0
机构: Siemens Corporate Research and Development, D- W-8000 München 83
[7]
VERY DENSE 102-LASER ARRAYS WITH EXTREMELY LOW THRESHOLD CURRENT
[J].
HIRATA, S
;
NARUI, H
;
MORI, Y
.
APPLIED PHYSICS LETTERS,
1991, 58 (04)
:319-321

HIRATA, S
论文数: 0 引用数: 0
h-index: 0
机构: Sony Corporation Research Center, Hodogaya-ku, Yokohama 240, 174, Fujitsuka-cho

NARUI, H
论文数: 0 引用数: 0
h-index: 0
机构: Sony Corporation Research Center, Hodogaya-ku, Yokohama 240, 174, Fujitsuka-cho

MORI, Y
论文数: 0 引用数: 0
h-index: 0
机构: Sony Corporation Research Center, Hodogaya-ku, Yokohama 240, 174, Fujitsuka-cho
[8]
SURFACE-DIFFUSION LENGTH DURING MOMBE AND CBE GROWTH MEASURED BY MU-RHEED
[J].
ISU, T
;
HATA, M
;
MORISHITA, Y
;
NOMURA, Y
;
GOTO, S
;
KATAYAMA, Y
.
JOURNAL OF CRYSTAL GROWTH,
1992, 120 (1-4)
:45-49

ISU, T
论文数: 0 引用数: 0
h-index: 0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN

HATA, M
论文数: 0 引用数: 0
h-index: 0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN

MORISHITA, Y
论文数: 0 引用数: 0
h-index: 0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN

NOMURA, Y
论文数: 0 引用数: 0
h-index: 0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN

GOTO, S
论文数: 0 引用数: 0
h-index: 0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN

KATAYAMA, Y
论文数: 0 引用数: 0
h-index: 0
机构:
OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN OPTOELECTR TECHNOL RES LAB,TSUKUBA,IBARAKI 30026,JAPAN
[9]
MULTIWAVELENGTH LASER ARRAY BY CHEMICAL BEAM EPITAXY ON PATTERNED INP SUBSTRATES
[J].
KAPRE, RM
;
TSANG, WT
;
CHEN, YK
;
SERGENT, AM
.
ELECTRONICS LETTERS,
1993, 29 (09)
:763-765

KAPRE, RM
论文数: 0 引用数: 0
h-index: 0
机构: AT&T Bell Laboratories, Murray Hill, NJ 07974

TSANG, WT
论文数: 0 引用数: 0
h-index: 0
机构: AT&T Bell Laboratories, Murray Hill, NJ 07974

CHEN, YK
论文数: 0 引用数: 0
h-index: 0
机构: AT&T Bell Laboratories, Murray Hill, NJ 07974

SERGENT, AM
论文数: 0 引用数: 0
h-index: 0
机构: AT&T Bell Laboratories, Murray Hill, NJ 07974
[10]
GAINASP INP INTEGRATED RIDGE LASER WITH A BUTT-JOINTED TRANSPARENT OPTICAL WAVE-GUIDE FABRICATED BY SINGLE-STEP METALORGANIC VAPOR-PHASE EPITAXY
[J].
REMIENS, D
;
ROSE, B
;
CARRE, M
;
HORNUNG, V
.
JOURNAL OF APPLIED PHYSICS,
1990, 68 (05)
:2450-2453

REMIENS, D
论文数: 0 引用数: 0
h-index: 0
机构: Centre National d'Etudes des Télécommunications, Laboratoire de Bagneux, 92220 Bagneux, 196, Avenue Henri Ravéra

ROSE, B
论文数: 0 引用数: 0
h-index: 0
机构: Centre National d'Etudes des Télécommunications, Laboratoire de Bagneux, 92220 Bagneux, 196, Avenue Henri Ravéra

CARRE, M
论文数: 0 引用数: 0
h-index: 0
机构: Centre National d'Etudes des Télécommunications, Laboratoire de Bagneux, 92220 Bagneux, 196, Avenue Henri Ravéra

HORNUNG, V
论文数: 0 引用数: 0
h-index: 0
机构: Centre National d'Etudes des Télécommunications, Laboratoire de Bagneux, 92220 Bagneux, 196, Avenue Henri Ravéra