INSITU INVESTIGATION OF TIN FORMATION ON TOP OF TISI2

被引：55

作者：

WILLEMSEN, MFC

KUIPER, AET

READER, AH

HOKKE, R

BARBOUR, JC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期

关键词：

D O I：

10.1116/1.584052

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：53 / 61

页数：9

共 14 条

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PARMANTIE, WD
[J]. IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1985, 20 (01) : 61 - 69
[2] TITANIUM SILICIDE FORMATION - EFFECT OF OXYGEN DISTRIBUTION IN THE METAL-FILM
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[J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (10) : 3558 - 3565
[3] PHASE-EQUILIBRIA IN THIN-FILM METALLIZATIONS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1984, 2 (04): : 781 - 784
[4] A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS
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MORGAN, AE
ELLWANGER, RC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06): : 2463 - 2469
[5] DAVIS LE, 1978, HDB AUGER ELECTRON S
[6] QUANTITATIVE AUGER-ELECTRON ANALYSIS OF TITANIUM NITRIDES
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TZATZOV, KK
[J]. SURFACE SCIENCE, 1985, 149 (01) : 105 - 118
[7] X-RAY BAND SPECTRA AND MOLECULAR-ORBITAL STRUCTURE OF RUTILE TIO2
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[J]. PHYSICAL REVIEW B, 1972, 5 (11): : 4219 - &
[8] CHARACTERIZATION OF LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AND THERMALLY GROWN SILICON-NITRIDE FILMS
HABRAKEN, FHPM
KUIPER, AET
VANOOSTROM, A
TAMMINGA, Y
THEETEN, JB
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (01) : 404 - 415
[9] SURFACE SEGREGATION AND INITIAL OXIDATION OF TITANIUM SILICIDE FILMS
KUIPER, AET
VANDERLIGT, GCJ
VANDEWIJGERT, WM
WILLEMSEN, MFC
HABRAKEN, FHPM
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03): : 830 - 835
[10] MORGAN AE, 1986, MATER RES SOC S P, V52, P279

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