DAMAGE INDUCED DURING CHANNELING MEASUREMENTS WITH A NUCLEAR MICROPROBE

被引：10

作者：

INOUE, K

TAKAI, M

ISHIBASHI, K

HIRAI, K

KAWATA, Y

NAMBA, S

机构：

[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN

[2] KOBE STEEL LTD,ELECTR RES LAB,NISHI KU,KOBE 67302,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 54卷 / 1-3期

关键词：

D O I：

10.1016/0168-583X(91)95518-I

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The damage in samples induced by probe ions during microbeam RBS/channeling was studied. Degradation of crystallinity of Si due to 400 keV He+ irradiation was observed at a dose higher than 2 x 10(17)/cm2 by measuring aligned RBS spectra. Swelling of the surface at the irradiated area was also observed at a dose of 1 x 10(18)/cm2.

引用

页码：231 / 233

页数：3

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