EVALUATION OF BEAM-INDUCED ABLATION DURING MICROBEAM IRRADIATION

被引：11

作者：

TAKAI, M

HIRAI, K

KINOMURA, A

NAMBA, S

ISHIBASHI, K

INOUE, K

KAWATA, Y

机构：

[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN

[2] KOBE STEEL LTD,ELECTR RES LAB,KOBE,HYOGO 67302,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 54卷 / 1-3期

关键词：

D O I：

10.1016/0168-583X(91)95515-F

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The swelling and ablation of the Si substrate surface took place at a microprobe dose of 10(18) and 7 x 10(18)/cm2, respectively, while those of Au thin films on Si started at a dose of 10(17) and 10(18)/cm2, respectively. The swelling and ablation are found to be due to the volume change in irradiated layers, giving rise to stress, which results in bubbling and blistering-explosion.

引用

页码：209 / 212

页数：4

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