COMPOSITION PROFILES AND SCHOTTKY-BARRIER HEIGHTS OF SILICIDES FORMED IN NIPT ALLOY-FILMS

被引：33

作者：

THOMAS, S ^{[1
]}

TERRY, LE ^{[1
]}

机构：

[1] MOTOROLA INC,SEMICOND PROD DIV,5005 E MCDOWELL RD,PHOENIX,AZ 85008

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 01期

关键词：

D O I：

10.1063/1.322316

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：301 / 307

页数：7

共 28 条

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