CHEMICAL-REACTION AND SILICIDE FORMATION AT THE PT/SI INTERFACE

被引：43

作者：

MATZ, R

PURTELL, RJ

YOKOTA, Y

RUBLOFF, GW

HO, PS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.572574

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：253 / 258

页数：6

共 26 条

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