AUGER-ELECTRON SPECTROSCOPY IN SPUTTERING MEASUREMENTS - APPLICATION TO LOW-ENERGY AR+ SPUTTERING OF AG AND NB

被引：11

作者：

SMITH, JN ^{[1
]}

MEYER, CH ^{[1
]}

LAYTON, JK ^{[1
]}

机构：

[1] GEN ATOM CO,SAN DIEGO,CA 92138

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 10期

关键词：

D O I：

10.1063/1.321449

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4291 / 4293

页数：3

共 11 条

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[8] FAST ROTATION TECHNIQUE FOR FORMATION OF A THIN-FILM INTERMETALLIC COMPOUND ON A CYLINDRICAL METALLIC SUBSTRATE [J].

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[9] SPUTTERING OF NIOBIUM BY NIOBIUM, HYDROGEN, DEUTERIUM, AND HELIUM IONS IN 10-KEV TO 80-KEV ENERGY RANGE [J].

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[10] ALLOY SPUTTERING STUDIES WITH IN-SITU AUGER ELECTRON SPECTROSCOPY [J].

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