LATTICE-DEFECTS IN HIGH-DOSE AS IMPLANTATION INTO LOCALIZED SI AREA

被引：21

作者：

TAMURA, M

HORIUCHI, M

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1988年 / 27卷 / 12期

关键词：

D O I：

10.1143/JJAP.27.2209

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2209 / 2217

页数：9

共 14 条

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