CHROMIUM AS A DIFFUSION BARRIER BETWEEN NISI, PD2SI, OR PTSI AND AL

被引:7
作者
BARTUR, M
NICOLET, MA
机构
关键词
D O I
10.1149/1.2115762
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1118 / 1122
页数:5
相关论文
共 24 条
[11]   ELECTRICAL AND MECHANICAL FEATURES OF PLATINUM SILICIDE-ALUMINUM REACTION [J].
HOSACK, HH .
JOURNAL OF APPLIED PHYSICS, 1973, 44 (08) :3476-3485
[12]   KINETICS OF COMPOUND FORMATION IN THIN-FILM COUPLES OF AL AND TRANSITION-METALS [J].
HOWARD, JK ;
LEVER, RF ;
SMITH, PJ ;
HO, PS .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01) :68-71
[13]   CONTACT METALLURGY FOR SHALLOW JUNCTION SI DEVICES [J].
KIRCHER, CJ .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5394-5399
[14]  
KOSTER U, 1982, J APPL PHYS, V53, P7436, DOI 10.1063/1.330113
[15]   BEHAVIOR AND INFLUENCE OF OXYGEN IN CHROMIUM SILICIDE FORMATION [J].
LIEN, CD ;
WIELUNSKI, LS ;
NICOLET, MA ;
STIKA, KM .
THIN SOLID FILMS, 1983, 104 (1-2) :235-242
[16]   THERMAL-STABILITY OF DIFFUSION-BARRIERS FOR ALUMINUM-ALLOY PLATINUM SILICIDE CONTACTS [J].
MERCHANT, P ;
AMANO, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :459-462
[17]   BILAYER SILICIDE FORMATION DURING THE INTERACTION OF THIN CHROMIUM, NICKEL AND PLATINUM FILMS WITH SILICON [J].
NAUDE, MO ;
PRETORIUS, R ;
MARAIS, DJ .
THIN SOLID FILMS, 1982, 89 (04) :339-348
[18]   DIFFUSION-BARRIERS IN LAYERED CONTACT STRUCTURES [J].
NICOLET, MA ;
BARTUR, M .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (03) :786-793
[19]   FORMATION KINETICS OF CRSI2 FILMS ON SI SUBSTRATES WITH AND WITHOUT INTERPOSED PD2SI LAYER [J].
OLOWOLAFE, JO ;
NICOLET, MA ;
MAYER, JW .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5182-5186
[20]   CHROMIUM THIN-FILM AS A BARRIER TO INTERACTION OF PD2SI WITH AL [J].
OLOWOLAFE, JO ;
NICOLET, MA ;
MAYER, JW .
SOLID-STATE ELECTRONICS, 1977, 20 (05) :413-415