共 163 条
- [71] NUCLEATION CONSIDERATIONS IN THE WAVELENGTH-DEPENDENT ACTIVATION SELECTIVITY OF ALUMINUM CHEMICAL-VAPOR DEPOSITION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (05): : 1441 - 1443
- [74] HOLLOWAY K, 1991, MATER RES SOC SYMP P, V204, P409
- [75] LASER CHEMICAL VAPOR-DEPOSITION OF COPPER [J]. APPLIED PHYSICS LETTERS, 1985, 46 (02) : 204 - 206
- [76] SURFACE PROCESSES LEADING TO CARBON CONTAMINATION OF PHOTOCHEMICALLY DEPOSITED COPPER-FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06): : 2452 - 2458
- [77] BASIC MECHANISMS IN LASER ETCHING AND DEPOSITION [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 41 (04): : 315 - 330
- [79] REPAIR OF TRANSPARENT DEFECTS ON PHOTOMASKS BY LASER-INDUCED METAL-DEPOSITION FROM AN AQUEOUS-SOLUTION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (04): : 635 - 642