SILICON-NITRIDE THIN-FILMS PREPARED BY THE ELECTRON-CYCLOTRON RESONANCE PLASMA CHEMICAL VAPOR-DEPOSITION METHOD

被引：93

作者：

MANABE, Y

MITSUYU, T

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 06期

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D O I：

10.1063/1.344258

中图分类号：

O59 [应用物理学];

学科分类号：

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页码：2475 / 2480

页数：6

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