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THRESHOLD VOLTAGE SHIFT OF N-CHANNEL SI-GATE MOSFETS
被引:5
作者
:
HORIUCHI, S
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
HORIUCHI, S
[
1
]
机构
:
[1]
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1975年
/ 22卷
/ 11期
关键词
:
D O I
:
10.1109/T-ED.1975.18265
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:1038 / 1043
页数:6
相关论文
共 18 条
[1]
PROPERTIES OF SILICON IMPLANTED WITH BORON IONS THROUGH THERMAL SILICON DIOXIDE
BAUER, LO
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
BAUER, LO
MACPHERSON, MR
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
MACPHERSON, MR
ROBINSON, AT
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
ROBINSON, AT
DILL, HG
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
DILL, HG
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(03)
: 289
-
+
[2]
DOUGLAS EC, 1974, IEEE T ELECTRON DEV, VED21, P324, DOI 10.1109/T-ED.1974.17924
[3]
DEPLETION-MODE IGFET MADE BY DEEP ION-IMPLANTATION
EDWARDS, JR
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
EDWARDS, JR
MARR, G
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
MARR, G
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1973,
ED20
(03)
: 283
-
289
[4]
N-CHANNEL ION-IMPLANTED ENHANCEMENT-DEPLETION FET CIRCUIT AND FABRICATION TECHNOLOGY
FORBES, L
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,COMPONENTS DIV,MANASSAS,VA 22110
IBM CORP,COMPONENTS DIV,MANASSAS,VA 22110
FORBES, L
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1973,
SC 8
(03)
: 226
-
230
[5]
RANGE DISTRIBUTION THEORY BASED ON ENERGY-DISTRIBUTION OF IMPLANTED IONS
FURUKAWA, S
论文数:
0
引用数:
0
h-index:
0
FURUKAWA, S
ISHIWARA, H
论文数:
0
引用数:
0
h-index:
0
ISHIWARA, H
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(03)
: 1268
-
&
[6]
REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
SAH, CT
论文数:
0
引用数:
0
h-index:
0
SAH, CT
LEISTIKO, O
论文数:
0
引用数:
0
h-index:
0
LEISTIKO, O
[J].
JOURNAL OF APPLIED PHYSICS,
1964,
35
(09)
: 2695
-
&
[7]
CHARACTERISTICS OF P-CHANNEL MOS FIELD-EFFECT TRANSISTORS WITH ION-IMPLANTED CHANNELS
HSWE, M
论文数:
0
引用数:
0
h-index:
0
HSWE, M
SHOPBELL, ML
论文数:
0
引用数:
0
h-index:
0
SHOPBELL, ML
MAI, CC
论文数:
0
引用数:
0
h-index:
0
MAI, CC
PALMER, RB
论文数:
0
引用数:
0
h-index:
0
PALMER, RB
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(11)
: 1237
-
+
[8]
ISHIWARA H, 1973, T IECE JPN C, V56, P179
[9]
JOHNSON WS, 1970, PROJECTED RANGE STAT
[10]
SURFACE DEPLETION REGION WIDTH DEPENDENCE OF THRESHOLD VOLTAGE SHIFT OF ION-IMPLANTED MOS-TRANSISTOR
KAMOSHIDA, M
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
KAMOSHIDA, M
KUDOH, O
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
KUDOH, O
[J].
APPLIED PHYSICS LETTERS,
1974,
24
(10)
: 501
-
503
←
1
2
→
共 18 条
[1]
PROPERTIES OF SILICON IMPLANTED WITH BORON IONS THROUGH THERMAL SILICON DIOXIDE
BAUER, LO
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
BAUER, LO
MACPHERSON, MR
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
MACPHERSON, MR
ROBINSON, AT
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
ROBINSON, AT
DILL, HG
论文数:
0
引用数:
0
h-index:
0
机构:
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
HUGHES AIRCRAFT CO, NEWPORT BEACH, CA 92663 USA
DILL, HG
[J].
SOLID-STATE ELECTRONICS,
1973,
16
(03)
: 289
-
+
[2]
DOUGLAS EC, 1974, IEEE T ELECTRON DEV, VED21, P324, DOI 10.1109/T-ED.1974.17924
[3]
DEPLETION-MODE IGFET MADE BY DEEP ION-IMPLANTATION
EDWARDS, JR
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
EDWARDS, JR
MARR, G
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,ALLENTOWN,PA 18103
BELL TEL LABS INC,ALLENTOWN,PA 18103
MARR, G
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1973,
ED20
(03)
: 283
-
289
[4]
N-CHANNEL ION-IMPLANTED ENHANCEMENT-DEPLETION FET CIRCUIT AND FABRICATION TECHNOLOGY
FORBES, L
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,COMPONENTS DIV,MANASSAS,VA 22110
IBM CORP,COMPONENTS DIV,MANASSAS,VA 22110
FORBES, L
[J].
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1973,
SC 8
(03)
: 226
-
230
[5]
RANGE DISTRIBUTION THEORY BASED ON ENERGY-DISTRIBUTION OF IMPLANTED IONS
FURUKAWA, S
论文数:
0
引用数:
0
h-index:
0
FURUKAWA, S
ISHIWARA, H
论文数:
0
引用数:
0
h-index:
0
ISHIWARA, H
[J].
JOURNAL OF APPLIED PHYSICS,
1972,
43
(03)
: 1268
-
&
[6]
REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
SAH, CT
论文数:
0
引用数:
0
h-index:
0
SAH, CT
LEISTIKO, O
论文数:
0
引用数:
0
h-index:
0
LEISTIKO, O
[J].
JOURNAL OF APPLIED PHYSICS,
1964,
35
(09)
: 2695
-
&
[7]
CHARACTERISTICS OF P-CHANNEL MOS FIELD-EFFECT TRANSISTORS WITH ION-IMPLANTED CHANNELS
HSWE, M
论文数:
0
引用数:
0
h-index:
0
HSWE, M
SHOPBELL, ML
论文数:
0
引用数:
0
h-index:
0
SHOPBELL, ML
MAI, CC
论文数:
0
引用数:
0
h-index:
0
MAI, CC
PALMER, RB
论文数:
0
引用数:
0
h-index:
0
PALMER, RB
[J].
SOLID-STATE ELECTRONICS,
1972,
15
(11)
: 1237
-
+
[8]
ISHIWARA H, 1973, T IECE JPN C, V56, P179
[9]
JOHNSON WS, 1970, PROJECTED RANGE STAT
[10]
SURFACE DEPLETION REGION WIDTH DEPENDENCE OF THRESHOLD VOLTAGE SHIFT OF ION-IMPLANTED MOS-TRANSISTOR
KAMOSHIDA, M
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
KAMOSHIDA, M
KUDOH, O
论文数:
0
引用数:
0
h-index:
0
机构:
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
NIPPON ELECT CO LTD, IC DIV, 1753 SHIMONUMABE, KAWASAKI, JAPAN
KUDOH, O
[J].
APPLIED PHYSICS LETTERS,
1974,
24
(10)
: 501
-
503
←
1
2
→