SPIN-COATED AS2S3 - A BARRIER LAYER FOR HIGH-RESOLUTION TRILAYER RESIST SYSTEM

被引：11

作者：

SINGH, B ^{[1
]}

CHERN, GC ^{[1
]}

LAUKS, I ^{[1
]}

机构：

[1] UNIV PENN,MOORE SCH ELECT ENGN,CTR CHEM ELECTR,DEPT ELECT ENGN,PHILADELPHIA,PA 19104

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583256

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：327 / 330

页数：4

共 12 条

[1]

[Anonymous], UNPUB

[2] A 3-LAYER RESIST SYSTEM FOR DEEP UV AND RIE MICROLITHOGRAPHY ON NONPLANAR SURFACES [J].

BASSOUS, E ;

EPHRATH, LM ;

PEPPER, G ;

MIKALSEN, DJ .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (02) :478-484

[3]

BURGGRAAF PS, 1983, SEMICONDUCTOR INT, V6, P48

[4] SPIN COATED AMORPHOUS-CHALCOGENIDE FILMS - THERMAL-PROPERTIES [J].

CHERN, GC ;

LAUKS, I ;

MCGHIE, AR .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (08) :4596-4601

[5] SPIN-COATED AMORPHOUS-CHALCOGENIDE FILMS [J].

CHERN, GC ;

LAUKS, I .

JOURNAL OF APPLIED PHYSICS, 1982, 53 (10) :6979-6982

[6]

LIN BJ, 1983, SOLID STATE TECHNOL, V26, P105

[7] USE OF ANTIREFLECTIVE COATING IN BILAYER RESIST PROCESS [J].

LIN, YC ;

JONES, S ;

FULLER, G .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1215-1218

[8] HIGH-RESOLUTION, STEEP PROFILE RESIST PATTERNS [J].

MORAN, JM ;

MAYDAN, D .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1620-1624

[9] SPIN-ON GLASS AS AN INTERMEDIATE LAYER IN A TRI-LAYER RESIST PROCESS [J].

RAY, GW ;

PENG, S ;

BURRIESCI, D ;

OTOOLE, MM ;

LIU, ED .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (09) :2152-2154

[10] HIGH-RESOLUTION PATTERNING WITH AG2S/AS2S3 INORGANIC ELECTRON-BEAM RESIST AND REACTIVE ION ETCHING [J].

SINGH, B ;

BEAUMONT, SP ;

WEBB, A ;

BOWER, PG ;

WILKINSON, CDW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1174-1177

← 1 2 →