SCHOTTKY CONTACT BARRIER HEIGHT ENHANCEMENT ON PARA-TYPE SILICON BY WET CHEMICAL ETCHING

被引:7
作者
ADEGBOYEGA, GA
POGGI, A
SUSI, E
CASTALDINI, A
CAVALLINI, A
机构
[1] CNR,IST LAMEL,I-40126 BOLOGNA,ITALY
[2] UNIV BOLOGNA,INST PHYS,GNSM CISM GRP,I-40126 BOLOGNA,ITALY
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1989年 / 48卷 / 04期
关键词
D O I
10.1007/BF00618904
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:391 / 395
页数:5
相关论文
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