STEP STRUCTURE AND INTERFACE MORPHOLOGY - ARSENIC ON VICINAL SILICON SURFACES

被引:31
作者
OHNO, TR [1 ]
WILLIAMS, ED [1 ]
机构
[1] UNIV MARYLAND,DEPT PHYS,COLLEGE PK,MD 20742
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 04期
关键词
D O I
10.1116/1.584981
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:874 / 883
页数:10
相关论文
共 56 条
[31]   MICROSCOPIC MODEL OF HETEROEPITAXY OF GAAS ON SI(100) [J].
KAXIRAS, E ;
ALERHAND, OL ;
JOANNOPOULOS, JD ;
TURNER, GW .
PHYSICAL REVIEW LETTERS, 1989, 62 (21) :2484-2486
[32]   POLAR-ON-NONPOLAR EPITAXY [J].
KROEMER, H .
JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) :193-204
[33]   IMPROVEMENT IN THE CRYSTALLINE QUALITY OF HETEROEPITAXIAL GAAS ON SI FILMS GROWN BY MODULATED MOLECULAR-BEAM EPITAXY [J].
LEE, HP ;
LIU, XM ;
WANG, S ;
GEORGE, T ;
WEBER, ER .
APPLIED PHYSICS LETTERS, 1989, 54 (26) :2695-2697
[34]   NOVEL STRAIN-INDUCED DEFECT IN THIN MOLECULAR-BEAM-EPITAXY LAYERS [J].
LEGOUES, FK ;
COPEL, M ;
TROMP, R .
PHYSICAL REVIEW LETTERS, 1989, 63 (17) :1826-1829
[35]   DISLOCATION MICROSTRUCTURES ON FLAT AND STEPPED SI SURFACES - GUIDANCE FOR GROWING HIGH-QUALITY GAAS ON (100) SI SUBSTRATES [J].
LO, YH ;
WU, MC ;
LEE, H ;
WANG, S ;
LILIENTALWEBER, Z .
APPLIED PHYSICS LETTERS, 1988, 52 (17) :1386-1388
[36]  
MASHANOV VI, 1982, JETP LETT+, V36, P356
[37]   A GAP DECOMPOSITION SOURCE FOR PRODUCING A DIMER PHOSPHORUS MOLECULAR-BEAM FREE OF GALLIUM AND TETRAMER PHOSPHORUS [J].
MONDRY, MJ ;
CAINE, EJ ;
KROEMER, H .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (02) :316-318
[38]  
MOORE AJW, 1963, METAL SURFACES, P155
[39]   BIATOMIC LAYER-HIGH STEPS ON SI(001)2X1 SURFACE [J].
NAKAYAMA, T ;
TANISHIRO, Y ;
TAKAYANAGI, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1987, 26 (04) :L280-L282
[40]   ARSENIC-INDUCED STEP REARRANGEMENTS ON VICINAL SI(111) SUBSTRATES [J].
OHNO, TR ;
WILLIAMS, ED .
APPLIED PHYSICS LETTERS, 1989, 55 (25) :2628-2630