AL/SI CONTACT RESISTANCE FOR SUBMICROMETER DESIGN RULES

被引：5

作者：

FORD, JM ^{[1
]}

机构：

[1] MIT,DEPT ELECT ENGN & COMP SCI,CAMBRIDGE,MA 02139

来源：

IEEE TRANSACTIONS ON ELECTRON DEVICES | 1985年 / 32卷 / 04期

关键词：

D O I：

10.1109/T-ED.1985.22030

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：840 / 842

页数：3

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