EFFECTS OF ION-IMPLANTATION ON THE THERMAL GROWTH OF PT AND NIPT SILICIDES

被引：2

作者：

ORENT, TW ^{[1
]}

KNUDSON, CI ^{[1
]}

SARTELL, JA ^{[1
]}

LEE, S ^{[1
]}

BREWER, TL ^{[1
]}

机构：

[1] HONEYWELL CORP,CTR SOLID STATE DEV,PLYMOUTH,MN 55441

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期

关键词：

D O I：

10.1149/1.2119783

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：687 / 691

页数：5

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