CROSS-SECTIONAL SCANNING-TUNNELING-MICROSCOPY OF DOPED AND UNDOPED ALGAAS/GAAS HETEROSTRUCTURES

被引:15
作者
GWO, S
CHAO, KJ
SHIH, CK
机构
[1] Department of Physics, University of Texas, Austin
关键词
D O I
10.1063/1.111140
中图分类号
O59 [应用物理学];
学科分类号
摘要
Scanning tunneling microscopy (STM) was used to study the (NH4)(2)S-passivated (110) cross-sectional surfaces of both doped and undoped Al0.3Ga0.7As/GaAs heterostructures on n(+)-substrates. The ex situ (NH4)(2)S treatment of the cross-sectional surfaces of heterostructures was found to be very stable against oxidation. STM images showed no appreciable deterioration of surface quality in vacuum after more than 40 days. The spectroscopic results on the undoped epilayer showed diodelike behavior, confirming that an undoped large band gap region can be imaged by STM through carrier injection from the conductive regions.
引用
收藏
页码:493 / 495
页数:3
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