DIFFUSION OF OXYGEN IN SILICON THERMAL OXIDES

被引：23

作者：

TAFT, EA

机构：

[1] GE, Schenectady, NY, USA, GE, Schenectady, NY, USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 10期

关键词：

D O I：

10.1149/1.2113605

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2486 / 2489

页数：4

共 24 条

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HELMS, CR .

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[7] KINETICS OF THERMAL OXIDATION OF SILICON IN O2-N2 MIXTURES AT 1200 DEGREESC [J].

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[8] THERMAL OXIDATION OF SILICON - INSITU MEASUREMENT OF GROWTH-RATE USING ELLIPSOMETRY [J].

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[9] THERMAL-OXIDATION OF SILICON - CHEMISORPTION AND LINEAR RATE-CONSTANT [J].

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[10] EFFECTS OF TRACE AMOUNTS OF WATER ON THERMAL OXIDATION OF SILICON IN OXYGEN [J].

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