HEAVILY ARSENIC-DOPED SILICON EPITAXIAL-FILMS GROWN BY PARTIALLY IONIZED MBE

被引:14
作者
SUGIYAMA, T [1 ]
ITOH, T [1 ]
机构
[1] WASEDA UNIV,SCH SCI & ENGN,TOKYO 160,JAPAN
关键词
D O I
10.1149/1.2108628
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:604 / 609
页数:6
相关论文
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