SOLUBILITY AND DIFFUSION-COEFFICIENT OF OXYGEN IN SILICON

被引：40

作者：

ITOH, Y

NOZAKI, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 03期

关键词：

D O I：

10.1143/JJAP.24.279

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：279 / 284

页数：6

共 17 条

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