POSSIBLE APPLICATIONS OF TANTALUM SILICIDE FOR VERY-LARGE-SCALE INTEGRATION TECHNOLOGY

被引：7

作者：

HIEBER, K

NEPPL, F

机构：

[1] Siemens AG, Munich, West Ger, Siemens AG, Munich, West Ger

来源：

THIN SOLID FILMS | 1986年 / 140卷 / 01期

关键词：

539 Metals Corrosion and Protection; Metal Plating - 713 Electronic Circuits - 714 Electronic Components and Tubes - 804 Chemical Products Generally;

D O I：

10.1016/0040-6090(86)90167-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：131 / 135

页数：5

共 11 条

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