PTSI CONTACT METALLURGY - COMPARISON OF DIFFERENT ANNEALING SEQUENCES, ANNEALING TIME AND AMBIENTS, AND DEPOSITION TECHNIQUES OF PT

被引：15

作者：

CHANG, CA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 09期

关键词：

D O I：

10.1063/1.336888

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3116 / 3121

页数：6

共 30 条

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[10]

CHANG CA, J VAC SCI TECHNOL A

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