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EFFECTS OF TRICHLOROETHYLENE ADDITION ON THERMAL-OXIDATION OF SILICON AT 1200-DEGREES-C
被引:9
作者
:
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
HATTORI, T
机构
:
来源
:
JAPANESE JOURNAL OF APPLIED PHYSICS
|
1978年
/ 17卷
/ 01期
关键词
:
D O I
:
10.1143/JJAP.17.69
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:69 / 72
页数:4
相关论文
共 11 条
[1]
OXIDE CHARGE REDUCTION BY CHEMICAL GETTERING WITH TRICHLOROETHYLENE DURING THERMAL OXIDATION OF SILICON
[J].
CHEN, MC
论文数:
0
引用数:
0
h-index:
0
CHEN, MC
;
HILE, JW
论文数:
0
引用数:
0
h-index:
0
HILE, JW
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(02)
:223
-+
[2]
GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(12)
:3770
-&
[3]
EFFECTS OF TRICHLOROETHYLENE-OXIDATION ON CHARACTERISTICS OF MOS DEVICES
[J].
DECLERCK, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
DECLERCK, GJ
;
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
HATTORI, T
;
MAY, GA
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
MAY, GA
;
BEAUDOUIN, J
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
BEAUDOUIN, J
;
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
MEINDL, JD
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(03)
:436
-439
[4]
GETTERING OF STACKING-FAULT NUCLEI IN SILICON BY TRICHLOROETHYLENE OXIDATION
[J].
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
机构:
SONY CORP,RES CTR,YOKOHAMA 240,JAPAN
SONY CORP,RES CTR,YOKOHAMA 240,JAPAN
HATTORI, T
.
APPLIED PHYSICS LETTERS,
1977,
30
(07)
:312
-314
[5]
ELIMINATION OF STACKING-FAULTS IN SILICON BY TRICHLOROETHYLENE OXIDATION
[J].
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
机构:
SONY CORP,RES CTR,HODOGAYA KU,YOKOHAMA 240,JAPAN
SONY CORP,RES CTR,HODOGAYA KU,YOKOHAMA 240,JAPAN
HATTORI, T
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(06)
:945
-946
[6]
HATTORI T, UNPUBLISHED
[7]
KINETICS OF THERMAL GROWTH OF HCI-O2 OXIDES ON SILICON
[J].
HIRABAYA.K
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
HIRABAYA.K
;
IWAMURA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
IWAMURA, J
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(11)
:1595
-1601
[8]
EFFECT OF HCL AND CL2 ON THERMAL OXIDATION OF SILICON
[J].
KRIEGLER, RJ
论文数:
0
引用数:
0
h-index:
0
KRIEGLER, RJ
;
CHENG, YC
论文数:
0
引用数:
0
h-index:
0
CHENG, YC
;
COLTON, DR
论文数:
0
引用数:
0
h-index:
0
COLTON, DR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(03)
:388
-&
[9]
DIELECTRIC-BREAKDOWN PROPERTIES OF SIO2-FILMS GROWN IN HALOGEN AND HYDROGEN-CONTAINING ENVIRONMENTS
[J].
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
OSBURN, CM
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(06)
:809
-815
[10]
HYDROGEN CHLORIDE AND CHLORINE GETTERING - EFFECTIVE TECHNIQUE FOR IMPROVING PERFORMANCE OF SILICON DEVICES
[J].
RONEN, RS
论文数:
0
引用数:
0
h-index:
0
RONEN, RS
;
ROBINSON, PH
论文数:
0
引用数:
0
h-index:
0
ROBINSON, PH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(06)
:747
-+
←
1
2
→
共 11 条
[1]
OXIDE CHARGE REDUCTION BY CHEMICAL GETTERING WITH TRICHLOROETHYLENE DURING THERMAL OXIDATION OF SILICON
[J].
CHEN, MC
论文数:
0
引用数:
0
h-index:
0
CHEN, MC
;
HILE, JW
论文数:
0
引用数:
0
h-index:
0
HILE, JW
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(02)
:223
-+
[2]
GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON
[J].
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
;
GROVE, AS
论文数:
0
引用数:
0
h-index:
0
GROVE, AS
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(12)
:3770
-&
[3]
EFFECTS OF TRICHLOROETHYLENE-OXIDATION ON CHARACTERISTICS OF MOS DEVICES
[J].
DECLERCK, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
DECLERCK, GJ
;
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
HATTORI, T
;
MAY, GA
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
MAY, GA
;
BEAUDOUIN, J
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
BEAUDOUIN, J
;
MEINDL, JD
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
STANFORD UNIV, INTEGRATED CIRCUITS LAB, STANFORD, CA 94305 USA
MEINDL, JD
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1975,
122
(03)
:436
-439
[4]
GETTERING OF STACKING-FAULT NUCLEI IN SILICON BY TRICHLOROETHYLENE OXIDATION
[J].
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
机构:
SONY CORP,RES CTR,YOKOHAMA 240,JAPAN
SONY CORP,RES CTR,YOKOHAMA 240,JAPAN
HATTORI, T
.
APPLIED PHYSICS LETTERS,
1977,
30
(07)
:312
-314
[5]
ELIMINATION OF STACKING-FAULTS IN SILICON BY TRICHLOROETHYLENE OXIDATION
[J].
HATTORI, T
论文数:
0
引用数:
0
h-index:
0
机构:
SONY CORP,RES CTR,HODOGAYA KU,YOKOHAMA 240,JAPAN
SONY CORP,RES CTR,HODOGAYA KU,YOKOHAMA 240,JAPAN
HATTORI, T
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(06)
:945
-946
[6]
HATTORI T, UNPUBLISHED
[7]
KINETICS OF THERMAL GROWTH OF HCI-O2 OXIDES ON SILICON
[J].
HIRABAYA.K
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
HIRABAYA.K
;
IWAMURA, J
论文数:
0
引用数:
0
h-index:
0
机构:
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,KAWASAKI 210,JAPAN
IWAMURA, J
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(11)
:1595
-1601
[8]
EFFECT OF HCL AND CL2 ON THERMAL OXIDATION OF SILICON
[J].
KRIEGLER, RJ
论文数:
0
引用数:
0
h-index:
0
KRIEGLER, RJ
;
CHENG, YC
论文数:
0
引用数:
0
h-index:
0
CHENG, YC
;
COLTON, DR
论文数:
0
引用数:
0
h-index:
0
COLTON, DR
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(03)
:388
-&
[9]
DIELECTRIC-BREAKDOWN PROPERTIES OF SIO2-FILMS GROWN IN HALOGEN AND HYDROGEN-CONTAINING ENVIRONMENTS
[J].
OSBURN, CM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
OSBURN, CM
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1974,
121
(06)
:809
-815
[10]
HYDROGEN CHLORIDE AND CHLORINE GETTERING - EFFECTIVE TECHNIQUE FOR IMPROVING PERFORMANCE OF SILICON DEVICES
[J].
RONEN, RS
论文数:
0
引用数:
0
h-index:
0
RONEN, RS
;
ROBINSON, PH
论文数:
0
引用数:
0
h-index:
0
ROBINSON, PH
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1972,
119
(06)
:747
-+
←
1
2
→