INFRARED-SPECTROSCOPY OF THIN SILICON DIOXIDE ON SILICON

被引：89

作者：

OLSEN, JE

SHIMURA, F

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 20期

关键词：

D O I：

10.1063/1.100487

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1934 / 1936

页数：3

共 25 条

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[8]

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