EFFECT OF LOCALIZED STATES ON THE ELECTRICAL CHARACTERISTICS OF METAL-SEMICONDUCTOR FIELD-EFFECT TRANSISTORS

被引:10
作者
CHATTOPADHYAY, P
PAL, J
机构
[1] Department of Electronic Science, University College of Science, Calcutta
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1995年 / 147卷 / 02期
关键词
D O I
10.1002/pssa.2211470234
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The electrical characteristics of MESFETS are studied by considering the effect of localized states at the gate-substrate interface. It is seen that in presence of a high density of localized states, the I(d) - U(d) characteristics become independent of gate bias. This signifies the importance of Fermi level pinning in these structures. An expression for the threshold voltage is derived which is a function of the doping concentration, drain voltage, and the interface parameters, namely, the density of localized states, the neutral level energy, and the thickness of the interfacial oxide layer.
引用
收藏
页码:633 / 642
页数:10
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