A NEW FORMATION PROCESS OF ANODIZABLE STRUCTURES OF N,N+, AND N- SILICON FOR THE PRODUCTION OF SILICON-ON-INSULATOR STRUCTURES

被引:11
作者
TU, XZ [1 ]
机构
[1] TEXAS A&M UNIV,DEPT ELECT ENGN,COLLEGE STN,TX 77843
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 05期
关键词
D O I
10.1116/1.584208
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:1530 / 1532
页数:3
相关论文
共 11 条
[1]   LARGE AREA, UNIFORM SILICON-ON-INSULATOR USING A BURIED LAYER OF OXIDIZED POROUS SILICON [J].
BENJAMIN, JD ;
KEEN, JM ;
CULLIS, AG ;
INNES, B ;
CHEW, NG .
APPLIED PHYSICS LETTERS, 1986, 49 (12) :716-718
[2]  
BOMCHIL G, 1985, 1985 P MAT RES SOC M, V4, P463
[3]   CONVERSION OF THE CONDUCTIVITY MODE IN SILICON BY OXYGEN ION-IMPLANTATION AND ITS APPLICATION IN A NOVEL DIELECTRIC ISOLATION TECHNIQUE [J].
CHI, JY ;
HOLMSTROM, RP ;
MAO, BY .
APPLIED PHYSICS LETTERS, 1982, 40 (05) :420-422
[4]   COMPLETE DIELECTRIC ISOLATION BY HIGHLY SELECTIVE AND SELF-STOPPING FORMATION OF OXIDIZED POROUS SILICON [J].
HOLMSTROM, RP ;
CHI, JY .
APPLIED PHYSICS LETTERS, 1983, 42 (04) :386-388
[5]   CRYSTALLINE QUALITY OF SILICON LAYER FORMED BY FIPOS TECHNOLOGY [J].
IMAI, K ;
UNNO, H ;
TAKAOKA, H .
JOURNAL OF CRYSTAL GROWTH, 1983, 63 (03) :547-553
[6]   NITROGEN-IMPLANTED SILICON .2. ELECTRICAL PROPERTIES [J].
MITCHELL, JB ;
SHEWCHUN, J ;
THOMPSON, DA ;
DAVIES, JA .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) :335-343
[7]   NITROGEN-IMPLANTED SILICON .1. DAMAGE ANNEALING AND LATTICE LOCATION [J].
MITCHELL, JB ;
PRONKO, PP ;
SHEWCHUN, J ;
THOMPSON, DA ;
DAVIES, JA .
JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) :332-334
[8]  
NARAYAN J, 1984, J VAC SCI TECHNOL A, V2, P1309
[9]   ELECTRICAL PROPERTIES OF N-TYPE SI LAYERS DOPED WITH PROTON BOMBARDMENT INDUCED SHALLOW DONORS [J].
OHMURA, Y ;
ZOHTA, Y ;
KANAZAWA, M .
SOLID STATE COMMUNICATIONS, 1972, 11 (01) :263-&
[10]   EFFECTS OF NITROGEN ON DISLOCATION BEHAVIOR AND MECHANICAL STRENGTH IN SILICON-CRYSTALS [J].
SUMINO, K ;
YONENAGA, I ;
IMAI, M ;
ABE, T .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) :5016-5020