APPLICATION OF CHEMICAL AND ELECTROCHEMICAL MICROMACHINING IN THE ELECTRONICS INDUSTRY

被引：62

作者：

DATTA, M

ROMANKIW, LT

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 06期

关键词：

D O I：

10.1149/1.2097055

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

收藏

页码：C285 / C292

页数：8

相关论文

共 84 条

[51] McGeough J.A., 1974, PRINCIPLES ELECTROCH
[52] MCGREIVY DJ, 1982, VLSI TECHNOLOGIES 80
[53] ELECTROCHEMICALL THINNED N/N+ EPITAXIAL SILICON - METHOD AND APPLICATIONS
MEEK, RL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (07) : 1240 - +
[54] ANODIC DISSOLUTION OF N+ SILICON
MEEK, RL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (03) : 437 - &
[55] MEHDIZADEH S, 1988, NOV AICHE M WASH
[56] ANODIC DISSOLUTION OF SILICON IN HYDROFLUORIC ACID SOLUTIONS
MEMMING, R
SCHWANDT, G
[J]. SURFACE SCIENCE, 1966, 4 (02) : 109 - &
[57] NONDESTRUCTIVE DETERMINATION OF THICKNESS AND PERFECTION OF SILICA FILMS
MURRAY, LA
GOLDSMITH, N
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (12) : 1297 - +
[58] LOCALIZED LASER ETCHING OF COMPOUND SEMICONDUCTORS IN AQUEOUS-SOLUTION
OSGOOD, RM
SANCHEZRUBIO, A
EHRLICH, DJ
DANEU, V
[J]. APPLIED PHYSICS LETTERS, 1982, 40 (05) : 391 - 393
[59] EVALUATION OF THIN FILM INSULATORS
PLISKIN, WA
[J]. THIN SOLID FILMS, 1968, 2 (1-2) : 1 - &
[60] DEEP-ULTRAVIOLET INDUCED WET ETCHING OF GAAS
PODLESNIK, DV
GILGEN, HH
OSGOOD, RM
[J]. APPLIED PHYSICS LETTERS, 1984, 45 (05) : 563 - 565

← 1 2 3 4 5 6 7 8 9 →