SPUTTER TYPE HF ION-SOURCE FOR ION-BEAM DEPOSITION APPARATUS

被引:18
作者
YAMASHITA, M
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 05期
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D O I
10.1143/JJAP.26.721
中图分类号
O59 [应用物理学];
学科分类号
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页码:721 / 727
页数:7
相关论文
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