RECENT ADVANCES IN CHEMICAL VAPOR GROWTH OF ELECTRONIC MATERIALS

被引：16

作者：

CHU, TL ^{[1
]}

SMELTZER, RK ^{[1
]}

机构：

[1] SO METHODIST UNIV, ELECTR SCI CTR, DALLAS, TX 75222 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1973年 / 10卷 / 01期

关键词：

D O I：

10.1116/1.1317938

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1 / 10

页数：10

共 165 条

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[20] THERMODYNAMIC AND EXPERIMENTAL ASPECTS OF GALLIUM ARSENIDE VAPOR GROWTH [J].

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