OPTICAL-CONSTANTS OF SILICON AND DRY OXYGEN OXIDES OF SILICON AT 5461A

[1] DETERMINATION OF PROPERTIES OF FILMS ON SILICON BY METHOD OF ELLIPSOMETRY [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1962, 52 (09) : 970 - &

[2] INTRINSIC OPTICAL ABSORPTION IN GERMANIUM-SILICON ALLOYS [J]. PHYSICAL REVIEW, 1958, 109 (03): : 695 - 710

[3] COHEN HM, 1965, PHYS CHEM GLASSES, V6, P149

[4] INTRINSIC OPTICAL ABSORPTION IN SINGLE-CRYSTAL GERMANIUM AND SILICON AT 77-DEGREES-K AND 300-DEGREES-K [J]. PHYSICAL REVIEW, 1955, 99 (04): : 1151 - 1155

[5] GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) : 3770 - &

[6] A SIMPLE NON-DESTRUCTIVE METHOD OF MEASURING THICKNESS OF TRANSPARENT THIN FILMS BETWEEN 10 AND 600 NM [J]. SOLID-STATE ELECTRONICS, 1968, 11 (01) : 59 - +

[7] MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) : 2429 - +

[8] GENERAL EQUATIONS OF SYMMETRICAL ELLIPSOMETER ARRANGEMENTS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1970, 60 (02) : 221 - &

[9] INTERSPECIMEN COMPARISON OF REFRACTIVE INDEX OF FUSED SILICA [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1965, 55 (10P1) : 1205 - &

[10] REFRACTIVE INDEX OF SIO2 FILMS GROWN ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (06) : 2011 - &

[1] DETERMINATION OF PROPERTIES OF FILMS ON SILICON BY METHOD OF ELLIPSOMETRY [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1962, 52 (09) : 970 - &

[2] INTRINSIC OPTICAL ABSORPTION IN GERMANIUM-SILICON ALLOYS [J]. PHYSICAL REVIEW, 1958, 109 (03): : 695 - 710

[3] COHEN HM, 1965, PHYS CHEM GLASSES, V6, P149

[4] INTRINSIC OPTICAL ABSORPTION IN SINGLE-CRYSTAL GERMANIUM AND SILICON AT 77-DEGREES-K AND 300-DEGREES-K [J]. PHYSICAL REVIEW, 1955, 99 (04): : 1151 - 1155

[5] GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) : 3770 - &

[6] A SIMPLE NON-DESTRUCTIVE METHOD OF MEASURING THICKNESS OF TRANSPARENT THIN FILMS BETWEEN 10 AND 600 NM [J]. SOLID-STATE ELECTRONICS, 1968, 11 (01) : 59 - +

[7] MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) : 2429 - +

[8] GENERAL EQUATIONS OF SYMMETRICAL ELLIPSOMETER ARRANGEMENTS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1970, 60 (02) : 221 - &

[9] INTERSPECIMEN COMPARISON OF REFRACTIVE INDEX OF FUSED SILICA [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1965, 55 (10P1) : 1205 - &

[10] REFRACTIVE INDEX OF SIO2 FILMS GROWN ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (06) : 2011 - &