CHARACTERIZATION OF HYDROGENATION AND DEHYDROGENATION OF POST-PLASMA TREATED LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED AMORPHOUS-SILICON FILMS

被引：8

作者：

NAKAMURA, M

OHNO, T

KONISHI, N

MIYATA, K

KAMEZAWA, N

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 09期

关键词：

D O I：

10.1063/1.339258

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3740 / 3746

页数：7

共 26 条

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