NEAR-SURFACE REGROWTH RATE EFFECTS IN HIGH-DOSE ION-IMPLANTED (100) SILICON

被引：38

作者：

WILLIAMS, JS

ELLIMAN, RG

机构：

来源：

APPLIED PHYSICS LETTERS | 1980年 / 37卷 / 09期

关键词：

D O I：

10.1063/1.92096

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：829 / 831

页数：3

共 12 条

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JOURNAL OF APPLIED PHYSICS, 1977, 48 (10) :4234-4240

[2] REGROWTH BEHAVIOR OF ION-IMPLANTED AMORPHOUS LAYERS ON [111] SILICON [J].

CSEPREGI, L ;

MAYER, JW ;

SIGMON, TW .

APPLIED PHYSICS LETTERS, 1976, 29 (02) :92-93

[3] CHANNELING EFFECT MEASUREMENTS OF RECRYSTALLIZATION OF AMORPHOUS SI LAYERS ON CRYSTAL SI [J].

CSEPREGI, L ;

MAYER, JW ;

SIGMON, TW .

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[4] INFLUENCE OF O-16, C-12, N-14, AND NOBLE-GASES ON CRYSTALLIZATION OF AMORPHOUS SI LAYERS [J].

KENNEDY, EF ;

CSEPREGI, L ;

MAYER, JW ;

SIGMON, TW .

JOURNAL OF APPLIED PHYSICS, 1977, 48 (10) :4241-4246

[5] ELECTRON-MICROSCOPY STUDY OF DEFECT STRUCTURES IN RECRYSTALLIZED AMORPHOUS LAYERS OF SELF-ION-IRRADIATED (111) SILICON [J].

RECHTIN, MD ;

PRONKO, PP ;

FOTI, G ;

CSEPREGI, L ;

KENNEDY, EF ;

MAYER, JW .

PHILOSOPHICAL MAGAZINE A-PHYSICS OF CONDENSED MATTER STRUCTURE DEFECTS AND MECHANICAL PROPERTIES, 1978, 37 (05) :605-620

[6] EPITAXIAL REGROWTH OF AR-IMPLANTED AMORPHOUS SILICON [J].

REVESZ, P ;

WITTMER, M ;

ROTH, J ;

MAYER, JW .

JOURNAL OF APPLIED PHYSICS, 1978, 49 (10) :5199-5206

[7] VISIBLE INTERFERENCE EFFECTS IN SILICON CAUSED BY HIGH-CURRENT-HIGH-DOSE IMPLANTATION [J].

SEIDEL, TE ;

PASTEUR, GA ;

TSAI, JCC .

APPLIED PHYSICS LETTERS, 1976, 29 (10) :648-651

[8] RECRYSTALLIZATION OF ION-IMPLANTED SILICON LAYERS .1. PB-ION IMPLANTED SI [J].

WILLIAMS, JS ;

CHRISTODOULIDES, CE ;

GRANT, WA ;

ANDREW, R ;

BRAWN, JR ;

BOOTH, M .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1977, 32 (1-2) :55-66

[9] APPLICATION OF HIGH-RESOLUTION RUTHERFORD BACKSCATTERING TECHNIQUES TO NEAR-SURFACE ANALYSIS [J].

WILLIAMS, JS .

NUCLEAR INSTRUMENTS & METHODS, 1978, 149 (1-3) :207-217

[10] THE INFLUENCE OF HIGH IMPLANT CONCENTRATION ON SOLID-PHASE EPITAXIAL REGROWTH IN (100) AND (111) SILICON [J].

WILLIAMS, JS ;

CHRISTODOULIDES, CE ;

GRANT, WA .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 48 (1-4) :157-160

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