SHORT-CHANNEL EFFECTS AND DRAIN-INDUCED BARRIER LOWERING IN NANOMETER-SCALE GAAS-MESFETS

被引:28
作者
ADAMS, JA [1 ]
THAYNE, IG [1 ]
WILKINSON, CDW [1 ]
BEAUMONT, SP [1 ]
JOHNSON, NP [1 ]
KEAN, AH [1 ]
STANLEY, CR [1 ]
机构
[1] UNIV GLASGOW,DEPT ELECTR & ELECT ENGN,NANOELECTR RES CTR,GLASGOW G12 8QQ,SCOTLAND
关键词
D O I
10.1109/16.214727
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Short-channel effects in GaAs MESFET's are investigated. MESFET's were fabricated with gate lengths in the range of 40 to 300 nm with GaAs and AlGaAs buffer layers. The MESFET's were characterized by dc transconductance, output conductance, and subthreshold measurements. This work focuses on overcoming the short-channel effect of large output conductance by the inclusion of an AlGaAs buffer layer, and identifying the benefit the AlGaAs buffer affords for reducing subthreshold current, including the effect of drain-induced barrier lowering. The design yielded 300-nm gate-length MESFET's with excellent suppression of the major short-channel effects.
引用
收藏
页码:1047 / 1052
页数:6
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