BASIC PHENOMENA IN REACTIVE LOW-PRESSURE PLASMAS USED FOR DEPOSITION AND ETCHING - CURRENT STATUS

被引：46

作者：

TURBAN, G

机构：

来源：

PURE AND APPLIED CHEMISTRY | 1984年 / 56卷 / 02期

关键词：

D O I：

10.1351/pac198456020215

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：215 / 230

页数：16

共 165 条

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