INVESTIGATION OF THE SIO2-INDUCED SUBSTRATE CURRENT IN SILICON FIELD-EFFECT TRANSISTORS

被引:56
作者
WEINBERG, ZA
FISCHETTI, MV
机构
关键词
D O I
10.1063/1.334771
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:443 / 451
页数:9
相关论文
共 44 条
[21]   HIGH-FIELD CURRENT INDUCED-POSITIVE CHARGE TRANSIENTS IN SIO2 [J].
NISSANCOHEN, Y ;
SHAPPIR, J ;
FROHMANBENTCHKOWSKY, D .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (10) :5793-5800
[22]   ELECTRON TRAPPING DETRAPPING WITHIN THIN SIO2-FILMS IN THE HIGH-FIELD TUNNELING REGIME [J].
OLIVO, P ;
RICCO, B ;
SANGIORGI, E .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (09) :5267-5276
[23]   INTERFACE STATE GENERATION IN THE SI-SIO2 SYSTEM BY PHOTOINJECTING ELECTRONS FROM AN AL FIELD PLATE [J].
PANG, S ;
LYON, SA ;
JOHNSON, WC .
APPLIED PHYSICS LETTERS, 1982, 40 (08) :709-711
[24]   TEMPERATURE-DEPENDENCE OF THE CURRENT IN SIO2 IN THE HIGH-FIELD TUNNELING REGIME [J].
RICCO, B ;
FISCHETTI, MV .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (12) :4322-4329
[25]   NOVEL MECHANISM FOR TUNNELING AND BREAKDOWN OF THIN SIO2-FILMS [J].
RICCO, B ;
AZBEL, MY ;
BRODSKY, MH .
PHYSICAL REVIEW LETTERS, 1983, 51 (19) :1795-1798
[26]   STUDY OF THE ATOMIC MODELS OF 3 DONORLIKE DEFECTS IN SILICON METAL-OXIDE-SEMICONDUCTOR STRUCTURES FROM THEIR GATE MATERIAL AND PROCESS DEPENDENCIES [J].
SAH, CT ;
SUN, JYC ;
TZOU, JJT .
JOURNAL OF APPLIED PHYSICS, 1984, 55 (06) :1525-1545
[27]   IMPACT IONIZATION AND POSITIVE CHARGE IN THIN SIO2-FILMS [J].
SHATZKES, M ;
AVRON, M .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (07) :3192-3202
[28]   HIGH-FIELD ELECTRON TRAPPING IN SIO2 [J].
SOLOMON, P .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (09) :3843-3849
[29]   CURRENT AND C-V INSTABILITIES IN SIO2 AT HIGH FIELDS [J].
SOLOMON, PM ;
AITKEN, JM .
APPLIED PHYSICS LETTERS, 1977, 31 (03) :215-217
[30]   SELF-CONSISTENT RESULTS FOR N-TYPE SI INVERSION LAYERS [J].
STERN, F .
PHYSICAL REVIEW B, 1972, 5 (12) :4891-&