STRUCTURAL AND ELECTRICAL-PROPERTIES OF PLASMA-DEPOSITED SILICON-NITRIDE FROM SIH4-N2 GAS-MIXTURE

被引：38

作者：

ZHOU, NS

FUJITA, S

SASAKI, A

机构：

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1985年 / 14卷 / 01期

关键词：

D O I：

10.1007/BF02657920

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：55 / 72

页数：18

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