INFLUENCE OF GALLIUM SOURCES ON IMPURITY DOPING IN GAS SOURCE MBE GAAS

被引：3

作者：

MISAWA, S

OKUMURA, H

YOSHIDA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 07期

关键词：

D O I：

10.1143/JJAP.26.1088

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1088 / 1091

页数：4

共 21 条

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