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EFFECTS OF IN AND SB DOPING IN LPE GROWTH THERMODYNAMICS AND IN GAAS LAYER QUALITIES
被引:6
作者
:
CHEN, JF
论文数:
0
引用数:
0
h-index:
0
CHEN, JF
WIE, CR
论文数:
0
引用数:
0
h-index:
0
WIE, CR
机构
:
来源
:
JOURNAL OF ELECTRONIC MATERIALS
|
1989年
/ 18卷
/ 03期
关键词
:
D O I
:
10.1007/BF02657989
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:399 / 406
页数:8
相关论文
共 21 条
[1]
ETCHING OF DISLOCATIONS ON LOW-INDEX FACES OF GAAS
[J].
ABRAHAMS, MS
论文数:
0
引用数:
0
h-index:
0
ABRAHAMS, MS
;
BUIOCCHI, CJ
论文数:
0
引用数:
0
h-index:
0
BUIOCCHI, CJ
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(09)
:2855
-&
[2]
LIQUID EPITAXIAL GROWTH OF GAASSB AND ITS USE AS A HIGH-EFFICIENCY, LONG-WAVELENGTH THRESHOLD PHOTOEMITTER
[J].
ANTYPAS, GA
论文数:
0
引用数:
0
h-index:
0
ANTYPAS, GA
;
JAMES, LW
论文数:
0
引用数:
0
h-index:
0
JAMES, LW
.
JOURNAL OF APPLIED PHYSICS,
1970,
41
(05)
:2165
-&
[3]
HIGH-QUALITY EPITAXIAL GAAS AND INP WAFERS BY ISOELECTRONIC DOPING
[J].
BENEKING, H
论文数:
0
引用数:
0
h-index:
0
BENEKING, H
;
NAROZNY, P
论文数:
0
引用数:
0
h-index:
0
NAROZNY, P
;
EMEIS, N
论文数:
0
引用数:
0
h-index:
0
EMEIS, N
.
APPLIED PHYSICS LETTERS,
1985,
47
(08)
:828
-830
[4]
LOW DEFECT DENSITIES IN MOLECULAR-BEAM EPITAXIAL GAAS ACHIEVED BY ISOELECTRONIC IN DOPING
[J].
BHATTACHARYA, PK
论文数:
0
引用数:
0
h-index:
0
BHATTACHARYA, PK
;
DHAR, S
论文数:
0
引用数:
0
h-index:
0
DHAR, S
;
BERGER, P
论文数:
0
引用数:
0
h-index:
0
BERGER, P
;
JUANG, FY
论文数:
0
引用数:
0
h-index:
0
JUANG, FY
.
APPLIED PHYSICS LETTERS,
1986,
49
(08)
:470
-472
[5]
EFFECT OF ISO-ELECTRONIC DOPANTS ON THE DISLOCATION DENSITY OF GAAS
[J].
BLOM, GM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BLOM, GM
;
WOODALL, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
WOODALL, JM
.
JOURNAL OF ELECTRONIC MATERIALS,
1988,
17
(05)
:391
-396
[6]
SILICON AND INDIUM DOPING OF GAAS - MEASUREMENTS OF THE EFFECT OF DOPING ON MECHANICAL-BEHAVIOR AND RELATION WITH DISLOCATION FORMATION
[J].
BOURRET, ED
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
BOURRET, ED
;
TABACHE, MG
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
TABACHE, MG
;
BEEMAN, JW
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
BEEMAN, JW
;
ELLIOT, AG
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
ELLIOT, AG
;
SCOTT, M
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
SCOTT, M
.
JOURNAL OF CRYSTAL GROWTH,
1987,
85
(1-2)
:275
-281
[7]
STRUCTURAL AND ELECTRICAL CONTACT PROPERTIES OF LPE GROWN GAAS DOPED WITH INDIUM
[J].
CHEN, JF
论文数:
0
引用数:
0
h-index:
0
CHEN, JF
;
WIE, CR
论文数:
0
引用数:
0
h-index:
0
WIE, CR
.
JOURNAL OF ELECTRONIC MATERIALS,
1988,
17
(06)
:501
-507
[8]
MECHANISM FOR DISLOCATION DENSITY REDUCTION IN GAAS CRYSTALS BY INDIUM ADDITION
[J].
EHRENREICH, H
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
EHRENREICH, H
;
HIRTH, JP
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
HIRTH, JP
.
APPLIED PHYSICS LETTERS,
1985,
46
(07)
:668
-670
[9]
HOBGOOD HM, 1984, SEMIINSULATING 3 5 M, P148
[10]
DISLOCATION-FREE GAAS AND INP CRYSTALS BY ISOELECTRONIC DOPING
[J].
JACOB, G
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
JACOB, G
;
DUSEAUX, M
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
DUSEAUX, M
;
FARGES, JP
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
FARGES, JP
;
VANDENBOOM, MMB
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
VANDENBOOM, MMB
;
ROKSNOER, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
ROKSNOER, PJ
.
JOURNAL OF CRYSTAL GROWTH,
1983,
61
(02)
:417
-424
←
1
2
3
→
共 21 条
[1]
ETCHING OF DISLOCATIONS ON LOW-INDEX FACES OF GAAS
[J].
ABRAHAMS, MS
论文数:
0
引用数:
0
h-index:
0
ABRAHAMS, MS
;
BUIOCCHI, CJ
论文数:
0
引用数:
0
h-index:
0
BUIOCCHI, CJ
.
JOURNAL OF APPLIED PHYSICS,
1965,
36
(09)
:2855
-&
[2]
LIQUID EPITAXIAL GROWTH OF GAASSB AND ITS USE AS A HIGH-EFFICIENCY, LONG-WAVELENGTH THRESHOLD PHOTOEMITTER
[J].
ANTYPAS, GA
论文数:
0
引用数:
0
h-index:
0
ANTYPAS, GA
;
JAMES, LW
论文数:
0
引用数:
0
h-index:
0
JAMES, LW
.
JOURNAL OF APPLIED PHYSICS,
1970,
41
(05)
:2165
-&
[3]
HIGH-QUALITY EPITAXIAL GAAS AND INP WAFERS BY ISOELECTRONIC DOPING
[J].
BENEKING, H
论文数:
0
引用数:
0
h-index:
0
BENEKING, H
;
NAROZNY, P
论文数:
0
引用数:
0
h-index:
0
NAROZNY, P
;
EMEIS, N
论文数:
0
引用数:
0
h-index:
0
EMEIS, N
.
APPLIED PHYSICS LETTERS,
1985,
47
(08)
:828
-830
[4]
LOW DEFECT DENSITIES IN MOLECULAR-BEAM EPITAXIAL GAAS ACHIEVED BY ISOELECTRONIC IN DOPING
[J].
BHATTACHARYA, PK
论文数:
0
引用数:
0
h-index:
0
BHATTACHARYA, PK
;
DHAR, S
论文数:
0
引用数:
0
h-index:
0
DHAR, S
;
BERGER, P
论文数:
0
引用数:
0
h-index:
0
BERGER, P
;
JUANG, FY
论文数:
0
引用数:
0
h-index:
0
JUANG, FY
.
APPLIED PHYSICS LETTERS,
1986,
49
(08)
:470
-472
[5]
EFFECT OF ISO-ELECTRONIC DOPANTS ON THE DISLOCATION DENSITY OF GAAS
[J].
BLOM, GM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
BLOM, GM
;
WOODALL, JM
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
WOODALL, JM
.
JOURNAL OF ELECTRONIC MATERIALS,
1988,
17
(05)
:391
-396
[6]
SILICON AND INDIUM DOPING OF GAAS - MEASUREMENTS OF THE EFFECT OF DOPING ON MECHANICAL-BEHAVIOR AND RELATION WITH DISLOCATION FORMATION
[J].
BOURRET, ED
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
BOURRET, ED
;
TABACHE, MG
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
TABACHE, MG
;
BEEMAN, JW
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
BEEMAN, JW
;
ELLIOT, AG
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
ELLIOT, AG
;
SCOTT, M
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD CORP,DIV OPTOELECTR,SAN JOSE,CA 95131
SCOTT, M
.
JOURNAL OF CRYSTAL GROWTH,
1987,
85
(1-2)
:275
-281
[7]
STRUCTURAL AND ELECTRICAL CONTACT PROPERTIES OF LPE GROWN GAAS DOPED WITH INDIUM
[J].
CHEN, JF
论文数:
0
引用数:
0
h-index:
0
CHEN, JF
;
WIE, CR
论文数:
0
引用数:
0
h-index:
0
WIE, CR
.
JOURNAL OF ELECTRONIC MATERIALS,
1988,
17
(06)
:501
-507
[8]
MECHANISM FOR DISLOCATION DENSITY REDUCTION IN GAAS CRYSTALS BY INDIUM ADDITION
[J].
EHRENREICH, H
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
EHRENREICH, H
;
HIRTH, JP
论文数:
0
引用数:
0
h-index:
0
机构:
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
OHIO STATE UNIV,DEPT MET ENGN,COLUMBUS,OH 43210
HIRTH, JP
.
APPLIED PHYSICS LETTERS,
1985,
46
(07)
:668
-670
[9]
HOBGOOD HM, 1984, SEMIINSULATING 3 5 M, P148
[10]
DISLOCATION-FREE GAAS AND INP CRYSTALS BY ISOELECTRONIC DOPING
[J].
JACOB, G
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
JACOB, G
;
DUSEAUX, M
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
DUSEAUX, M
;
FARGES, JP
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
FARGES, JP
;
VANDENBOOM, MMB
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
VANDENBOOM, MMB
;
ROKSNOER, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
LABS ELECTR & PHYS APPL,F-94450 LIMEIL BREVANNES,FRANCE
ROKSNOER, PJ
.
JOURNAL OF CRYSTAL GROWTH,
1983,
61
(02)
:417
-424
←
1
2
3
→