THE EFFECT OF OXYGEN ON THE ETCH RATE OF NF3 DISCHARGES

被引：19

作者：

NORDHEDEN, KJ

VERDEYEN, JT

机构：

[1] Univ of Illinois at, Urbana-Champaign, Urbana, IL, USA, Univ of Illinois at Urbana-Champaign, Urbana, IL, USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 10期

关键词：

D O I：

10.1149/1.2108363

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2168 / 2171

页数：4

共 13 条

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