PHOTOEMISSION OF ELECTRONS AND HOLES INTO SILICON NITRIDE

被引:58
作者
GOODMAN, AM
机构
[1] RCA Laboratories
关键词
D O I
10.1063/1.1652607
中图分类号
O59 [应用物理学];
学科分类号
摘要
The photoemission of both electrons and holes from degenerate silicon into thin (160-270 Å) layers of silicon nitride has been observed. The threshold energies for these processes are found to be 3.17 ± 0.1 eV for electrons and 3.06 ± 0.1 eV for holes. In addition, the photoemission of electrons from aluminum into silicon nitride has been observed; the threshold energy in this case is 2.11 ± 0.1 eV. An approximate electron energy band diagram for silicon nitride based on these values is presented. © 1968 The American Institute of Physics.
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页码:275 / &
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