SURFACE SMOOTHNESS AND CRYSTALLINE-STRUCTURE OF ICB DEPOSITED TIO2 FILMS

被引：13

作者：

FUKUSHIMA, K ^{[1
]}

YAMADA, I ^{[1
]}

机构：

[1] KYOTO UNIV,ION BEAM ENGN EXPTL LAB,KYOTO 606,JAPAN

来源：

APPLIED SURFACE SCIENCE | 1989年 / 43卷

关键词：

D O I：

10.1016/0169-4332(89)90186-4

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：32 / 36

页数：5

共 12 条

[1] EFFECT OF ION ASSISTED DEPOSITION ON OPTICAL SCATTER AND SURFACE MICROSTRUCTURE OF THIN-FILMS
ALJUMAILY, GA
MCNALLY, JJ
MCNEIL, JR
HERRMANN, WC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03): : 651 - 655
[2] EFFECTS OF OXYGEN IN ION-BEAM SPUTTER DEPOSITION OF TITANIUM-OXIDES
DEMIRYONT, H
SITES, JR
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (04): : 1457 - 1460
[3] CHARACTERISTICS OF TIO2 FILMS DEPOSITED BY A REACTIVE IONIZED CLUSTER BEAM
FUKUSHIMA, K
YAMADA, I
TAKAGI, T
[J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (11) : 4146 - 4149
[4] ELECTRICAL-PROPERTIES OF TIO2 FILMS DEPOSITED BY A REACTIVE-IONIZED CLUSTER BEAM
FUKUSHIMA, K
YAMADA, I
[J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (02) : 619 - 623
[5] ION SURFACE INTERACTIONS DURING VAPOR-PHASE CRYSTAL-GROWTH BY SPUTTERING, MBE, AND PLASMA-ENHANCED CVD - APPLICATIONS TO SEMICONDUCTORS
GREENE, JE
BARNETT, SA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (02): : 285 - 302
[6] AL SURFACE MOBILITY ON SI(111) DURING INITIAL-STAGES OF IONIZED CLUSTER BEAM DEPOSITION
LEVENSON, LL
ASANO, M
TANAKA, T
USUI, H
YAMADA, I
TAKAGI, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (03): : 1552 - 1556
[7] MACNEIL JR, 1984, APPL OPTICS, V23, P552
[8] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS
MARTIN, PJ
MACLEOD, HA
NETTERFIELD, RP
PACEY, CG
SAINTY, WG
[J]. APPLIED OPTICS, 1983, 22 (01): : 178 - 184
[9] ION-ASSISTED DEPOSITION OF BULKLIKE ZRO2 FILMS
MARTIN, PJ
NETTERFIELD, RP
SAINTY, WG
CLARK, GJ
LANFORD, WA
SIE, SH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 711 - 713
[10] PROPERTIES OF ION PLATED OXIDE-FILMS
PULKER, HK
HAAG, W
BUHLER, M
MOLL, E
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06): : 2700 - 2701

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