SHORT-CHANNEL MOSFETS FABRICATED USING CW ND - YAG LASER ANNEALING OF AS-IMPLANTED SOURCE AND DRAIN

被引：1

作者：

YOSHIDA, M

OKABAYASHI, H

ISHIDA, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1981年 / 20卷 / 11期

关键词：

D O I：

10.1143/JJAP.20.2121

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2121 / 2126

页数：6

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